Arc Plasma Deposited Copper and Gold Nanoparticles on FTO Substrate for Electrochemical Reduction of CO2

Abstract

FS Khan, M Sugiyama, K Fuji, and Y Nakano

A composite of copper and gold nanoparticles was deposited using arc plasma deposition on the conductive FTO substrate for the electrochemical reduction of CO2 . The use of arc plasma deposition system allows the nanoparticles to be implanted onto the substrate as opposed to the commonly used methods of vacuum deposition or electro deposition. This unique structure reduced the CO2 to produce formic acid with up to 60% faradaic efficiency. Copper and gold nanoparticles have never previously been reported to produce formic acid with such high efficiency, suggesting that the co-deposition technique of implanted nanoparticles can provide an interesting future avenue in the field of electrochemical reduction of CO2 . The surface analysis of the electrodes is presented here along with potential dependent faradaic efficiency of the electro catalysis.

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